Kafi, F.S.B.Jayathilaka, K.M.D.C.Wijesundera, R.P.Siripala, W.2022-01-052022-01-052021-06Journal of the National Science Foundation of Sri Lanka,49(1):p.61-66https://dl.nsf.gov.lk/handle/1/25472AnnealingCuprous oxideElectrodepositionPre treatmentsSchottky junctionSulphidationEffect of pre-surface treatments on p-Cu2 O/Au Schottky junctionsArticle