Perera, L.D.R.D.Siripala, W.Kalingamudali, S.R.D.Jayanetti, J.K.D.S.De Silva, K.T.L.2016-10-202016-10-201996Proceedings of the 51st Annual Sessions of the Sri Lanka Association for the Advancement of Science:p.160-161https://dl.nsf.gov.lk/handle/1/23423PhysicsElectrodepositionCuprous oxideI-V characteristicsArticleRG/94/P/003FR 1347T